Plasma Chemistry And Plasma Processing

Plasma Chemistry And Plasma Processing英文簡(jiǎn)介

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

Plasma Chemistry And Plasma Processing中文簡(jiǎn)介

《Plasma Chemistry And Plasma Processing》是一本由SPRINGER出版商出版的專業(yè)工程技術(shù)期刊，該刊創(chuàng)刊于1981年，刊期Quarterly，該刊已被國(guó)際權(quán)威數(shù)據(jù)庫SCIE、SCI收錄。在中科院最新升級(jí)版分區(qū)表中，該刊分區(qū)信息為大類學(xué)科：工程技術(shù) 3區(qū)，小類學(xué)科：工程：化工 3區(qū)；物理：應(yīng)用 3區(qū)；物理：流體與等離子體 3區(qū)；在JCR（Journal Citation Reports）分區(qū)等級(jí)為Q2。該刊發(fā)文范圍涵蓋工程：化工等領(lǐng)域，旨在及時(shí)、準(zhǔn)確、全面地報(bào)道國(guó)內(nèi)外工程：化工工作者在該領(lǐng)域取得的最新研究成果、工作進(jìn)展及學(xué)術(shù)動(dòng)態(tài)、技術(shù)革新等，促進(jìn)學(xué)術(shù)交流，鼓勵(lì)學(xué)術(shù)創(chuàng)新。2021年影響因子為3.337，平均審稿速度較慢,6-12周。

中科院分區(qū)最新升級(jí)版（當(dāng)前數(shù)據(jù)版本：2021年12月最新升級(jí)版）

大類學(xué)科	分區(qū)	小類學(xué)科	分區(qū)	Top期刊	綜述期刊
工程技術(shù)	3區(qū)	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：應(yīng)用 PHYSICS, FLUIDS & PLASMAS 物理：流體與等離子體	3區(qū) 3區(qū) 3區(qū)	否	否

JCR分區(qū)（當(dāng)前數(shù)據(jù)版本：2021-2022年最新版）

JCR分區(qū)等級(jí)	JCR所屬學(xué)科	分區(qū)	影響因子
Q2	PHYSICS, FLUIDS & PLASMAS	Q2	3.337
	PHYSICS, APPLIED	Q2
	ENGINEERING, CHEMICAL	Q2

期刊指數(shù)

影響因子	h-index	Gold OA文章占比	研究類文章占比	OA開放訪問	平均審稿速度
3.337	57	7.53%	93.24%	未開放	較慢,6-12周

IF值(影響因子)趨勢(shì)圖